Semiconductor Manufacturing Tour
Table of Contents
Slide 6 of 22
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Now we will start to construct the transistors on the wafer. The first step is to heat the epi-wafer to grow an oxide layer - silicon dioxide. At this point, we go to the lithography process, spin on photoresist, bake it to make it harder, expose the reticle step-by step over the wafer, then develop the resist to create the pattern on the wafer.
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The deposition, diffusion or implant processes that follow would actually destroy the photoresist, so the next step is to transfer the pattern from the photoresist to the tougher oxidelayer.....